Facilities and Equipments
1- Coating Unit
This unit can be used to glow a metal (gold, platina, palladium and others).
2- Programmable Spin Coater
Vacuum chuck Spin
Coater is designed for material research
lab to make quality sol-gel coating at easy and quick up to 8" diameter
wafer. The spin speed is variable from 0-5000 rpm .
3- Solar Simulation Systems
![](http://www.kfs.edu.eg/staff_site/photo/solar.jpg)
Applications:
Photovoltaic Cell Performance
- Determining
electrical performance of photovoltaic cells.
-Comparison of cell
characteristics among group of cells or different cell designs.
-Repeated measurement
of the same cell to study life cycle performance changes.
Photochemistry/Photobiology:
- Testing sunscreen
efficacy.
- Studying biological
effects of solar radiation.
Environmental Exposure Testing:
Evaluating the
effect of solar radiation on various materials and finishes.
4- I-V Measurement Systems
![](http://www.kfs.edu.eg/staff_site/photo/iv.jpg)
An I-V Measurement
System measures I-V curves of solar cells and calculates critical cell
performance parameters including Short circuit current (Isc), Open
circuit voltage (VOC),
Fill Factor (FF), Maximum current (Imax), Maximum voltage (Vmax), Maximum power (Pmax), and
Efficiency (n).
5- Shimadzu UV-VIS spectrophotometer
![](http://www.kfs.edu.eg/staff_site/photo/uv%20h.jpg)
6-Thin Film measurements
The Thin Film measurement system is based on white
light interference measurement to determine optical thickness. This white light
interference pattern is translated through mathematical functions into optical
thickness calculation. For single layer systems the physical thickness can then
be calculated when the n and k values of the materials are known.
7-Electrodeposition System
![](http://www.kfs.edu.eg/staff_site/photo/31102011071.jpg)
Electrodeposition has the following advantages
over conventional methods;
(1) thickness and morphology of films can be precisely controlled
by adjusting electrochemical parameters such as current or potential, (2) relatively uniform and compact
thin films can be synthesized either on substrates of complex shapes or in
column shaped material, (3) higher deposition rates can be
easily obtained over conventional processing, and (4) the equipment required is inexpensive
owing to the nonrequirement of either high vacuum or high reaction temperature.